Physics and technology of high-k gate dielectrics I : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, Reliability, and Manufacturing Issues, held in Salt Lake City, Utah, October 20-24, 2002

Loading edition detail...

Preparing this view.

Physics and technology of high-k gate dielectrics I : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, Reliability, and Manufacturing Issues, held in Salt Lake City, Utah, October 20-24, 2002

International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues (1st 2003 Salt Lake City, Utah)

Bookitis Pick

Cover for Physics and technology of high-k gate dielectrics I : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, Reliability, and Manufacturing Issues, held in Salt Lake City, Utah, October 20-24, 2002

Image source: Open Library

International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues (1st 2003 Salt Lake City, Utah)Published 2003cover on file

This page shows the publication-specific record: publisher, date, identifiers, and all of the context needed to decide whether this is the copy you want.

Main catalog entry More like this

Publisher	Electrochemical Society
Pages	304
Search language	english
ISBN_10	1-566-77395-4 primary

Other editions of this title

Publication-specific alternatives linked to the same work.

PA
Image source: Open Library
Physics and Technology of High-k Gate Dielectrics I
Electrochemical Society, Incorporated | 2003