Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3

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Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3

International Symposium on Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS (3rd 2007 Chicago, Ill.)

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Advanced gate stack, source/drain and channel engineering for...International Symposium on Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS (3rd 2007 Chicago, Ill.)

International Symposium on Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS (3rd 2007 Chicago, Ill.)Published 2007

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Publisher	Electrochemical Society
Pages	470
Search language	english
ISBN_13	978-1-566-77550-2 primary

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Advanced gate stack, source/dra...International Symposium on Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS (3rd 2007 Chicago, Ill.)
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3
International Symposium on Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS (3rd 2007 Chicago, Ill.) | Electrochemical Society | 2007