This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It encompasses all the links in the progress from fundamentals to applications: the description and modelling of different plasma sources to technological use; from general diagnostics to methods related to technological control and operation of plasma reactors. The book lays a foundation for the application of sources in industry (in high-tech electronics, microelectronics, IC fabrication, plasma chemistry, lighting, new materials, optics, the biomedical industry, aerospace, etc.), and in astrophysics, atomic physics, laser physics, accelerator physics and microwave devices.