Atomic Layer Deposition Of Nanostructured Materials
Work detail
"Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique)."--pub. desc.
Overview
Shared work-level identity and catalog context.
Contributors
People credited with this work in the active catalog.
- Open Author
Mato Knez
- Open Author
Nicola Pinna
Editions
Publication-specific versions linked to this work only.
- Image source: Open LibraryAL
Atomic Layer Deposition Of Nanostructured Materials
- ALAtomic Layer Deposition of Nano...Nicola Pinna, Mato Knez
Atomic Layer Deposition of Nanostructured Materials
- ALAtomic Layer Deposition of Nano...Nicola Pinna, Mato Knez
Atomic Layer Deposition of Nanostructured Materials
- ALAtomic Layer Deposition of Nano...Nicola Pinna, Mato Knez
Atomic Layer Deposition of Nanostructured Materials
- ALAtomic Layer Deposition of Nano...Nicola Pinna, Mato Knez
Atomic Layer Deposition of Nanostructured Materials